Gasparin A.; Baumvol, I. J. R.; Umpierre A. P.; Crespi A. E.; Figueroa, C. A.; Cemin F.; Nunes R. C. R.; Giacomelli, C "Adhesion measurement of Cu thin films on polyamide and polypropylene substrates" 11th International Conference on Advanced Materials, 2009, Rio de Janeiro - RJ. / Ver detalhes
Figueroa, C. A.; Baumvol, I. J. R.; C. Aguzzoli; Soares G. V. "Physicochemical and tribological investigations of TiC and VC thin films deposited on Si by DC reactive magnetron sputtering" 11th International Conference on Advanced Materials, 2009, Rio de Janeiro - RJ. / Ver detalhes
Aguzzoli, C.; Soares G. V.; Figueroa, C. A.; Baumvol, I. J. R. "Tribological and structural characterization of TiC and VC thin films deposited by DC magnetron sputtering" 10th International Workshop on Plasma-Based Ion Implantation & Deposition, 2009, São José dos Campos - SP. / Ver detalhes
Amorim C. L. G.; Figueroa, C. A.; Zorzi, J. E.;Basso, R. L. O., Baumvol, I. J. R.; Perottoni, C. A. "RF-induced plasma nitriding of zirconia" 10th International Workshop on Plasma-Based Ion Implantation & Deposition, 2009, São José dos Campos - SP. / Ver detalhes
Figueroa, C. A.; Portolan E.; Maia da Costa, M. E. H.; Dotto M. E. R.; Soares G. V.; Baumvol, I. J.R. ; Aguzzoli, C "Structural and mechanical properties of vanadium carbide obtained by dc reactive magnetron sputtering" 10th International Workshop on Plasma-Based Ion Implantation & Deposition, 2009, São José dos Campos - SP. / Ver detalhes
T. Weber, R. L. O. Basso, G. V. Soares, I. J. R. Baumvol, M. A. Z. Vasconcellos, C. Krug. Deposition and characterization of dc reactive magnetron sputtered titania and alumina coatings. 10th International Workshop Plasma-Based Ion Implantation & Deposition. / Ver detalhes
T. Weber, R. L. O. Basso, G. V. Soares, I. J. R. Baumvol, M. A. Z. Vasconcellos and C. Krug. Hysteresis effect and film characterization in DC reactive sputteringof titania and alumina. 11th International Conference on Advanced Materials.
Abstract:
In preparation to the fabrication of TiO2/Al2O3 nanolaminates, titania and alumina thin films were deposited on Si single crystals using DC reactive sputtering. Optimal reactive gas flow was determined from a hysteresis loop obtained with simultaneous operation of Ti and Al targets. Film stoichiometry, deposition rate, phase composition and nanohardness were determined. Results indicate that thermal treatment might be necessary to achieve ultrahardness in nanolaminates fabricated under the conditions studied. / Ver detalhes
Fabiano Pinto Pereira, Dácio Moreira Souza and Dante Ferreira Franceschini - In-situ optical characterization of plasma deposited a-C:H films during deposition by CH4 plasmas and erosion by N2-H2 plasmas - 11th International Conference on advanced materials - ICAM 2009 - Rio de Janeiro - 20 a 25 de setembro de 2009 / Ver detalhes
Carlos Manuel Sanchez Tasayco, Marcelo Eduardo Huguenin Maia da Costa, Dante Ferreira Franceschini - Pulsed Nd:YAG laser-deposition carbon thin films: Effect of the laser fluency - 11th International Conference on advanced materials - ICAM 2009 - Rio de Janeiro - 20 a 25 de setembro de 2009. / Ver detalhes
D.F. Franceschini, F.P. Pereira, D.M. Souza - New framework for structural characterization of a-C:H films from single-wavelength optical constants - 11th International Conference on advanced materials - ICAM 2009 - Rio de Janeiro - 20 a 25 de setembro de 2009. / Ver detalhes
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Instituto Nacional de Engenharia de Superfícies O Instituto, Serviços, Faça Parte, Fale Conosco
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O Instituto Nacional de Engenharia de Superfícies é um dos Institutos Nacionais de Ciência e Tecnologia (INCTs) do CNPq
Apoio
O Instituto Nacional de Engenharia de Superfícies, um dos INCTs do CNPq, reúne e articula em nível nacional os melhores recursos humanos e de infraestrutura em engenharia de superfícies. O instituto propõe uma estreita colaboração entre grupos de pesquisa e sistemas produtivos a serviço do crescimento sustentável do Brasil pela via da inovação tecnológica.
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