Instituto Nacional de Engenharia de Superfcies


Artigos e Patentes

Tag "krug"

  • 2009
  • T. Weber, R. L. O. Basso, G. V. Soares, I. J. R.Baumvol, M. A. Z. Vasconcellos, C. Krug. Deposition and characterization of dc reactivemagnetron sputtered titania and alumina coatings. 10th International WorkshopPlasma-Based Ion Implantation & Deposition. / Ver detalhes

  • T. Weber, R. L. O. Basso, G. V. Soares, I. J. R.Baumvol, M. A. Z. Vasconcellos, C. Krug. Deposition and characterization of dc reactivemagnetron sputtered titania and alumina coatings. 10th International WorkshopPlasma-Based Ion Implantation & Deposition. / Ver detalhes

  • S. A. Correa, G. G. Marmitt, N. M. Bom, A. T.da Rosa, F. C. Stedile, C. Radtke,
    G. V. Soares, I. J. R. Baumvol, C. Krug, and A. L. Gobbi, Appl. Phys. Enhancement in interface robustness regarding thermal oxidation in nanostructured Al[sub 2]O[sub 3] deposited on 4H-SiC Lett. 95, 051916 (2009), DOI:10.1063/1.3195702. http://dx.doi.org/10.1063/1.3195702. / Ver detalhes

  • T. Weber, R. L. O. Basso, G. V. Soares, I. J. R. Baumvol, M. A. Z. Vasconcellos and C. Krug. Hysteresis effect and film characterization in DC reactive sputteringof titania and alumina. 11th International Conference on Advanced Materials.

    Abstract:

    In preparation to the fabrication of TiO2/Al2O3 nanolaminates, titania and alumina thin films were deposited on Si single crystals using DC reactive sputtering. Optimal reactive gas flow was determined from a hysteresis loop obtained with simultaneous operation of Ti and Al targets. Film stoichiometry, deposition rate, phase composition and nanohardness were determined. Results indicate that thermal treatment might be necessary to achieve ultrahardness in nanolaminates fabricated under the conditions studied. / Ver detalhes

  • T. Weber, R. L. O. Basso, G. V. Soares, I. J. R. Baumvol, M. A. Z. Vasconcellos and C. Krug. Hysteresis effect and film characterization in DC reactive sputteringof titania and alumina. 11th International Conference on Advanced Materials.

    Abstract:

    In preparation to the fabrication of TiO2/Al2O3 nanolaminates, titania and alumina thin films were deposited on Si single crystals using DC reactive sputtering. Optimal reactive gas flow was determined from a hysteresis loop obtained with simultaneous operation of Ti and Al targets. Film stoichiometry, deposition rate, phase composition and nanohardness were determined. Results indicate that thermal treatment might be necessary to achieve ultrahardness in nanolaminates fabricated under the conditions studied. / Ver detalhes


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