• Notícias
• Midiateca
• Eventos
• Blog

Artigos e Patentes

Laboratório de Físico-Química de Superfícies e Interfaces Sólidas - Universidade Federal do Rio Grande do Sul (UFRGS)

• 2011

• SOARES, G. V. ; KRUG, C. ; MIOTTI, L. ; BASTOS, K. P. ; LUCOVSKY, G. ; BAUMVOL, I. J. R. ; RADTKE, C. . Intermixing between HfO[sub 2] and GeO[sub 2] films deposited on Ge(001) and Si(001): Role of the substrate. Applied Physics Letters, v. 98, p. 131912, 2011. / Ver detalhes

• 2010

• Krug, Cristiano ; RADTKE, C. Nanocristais semicondutores. In: Adriana Raffin Pohlmann; Carlos Otávio Petter; Naira Maria Balzaretti; Sílvia Staniscuaski Guterres. (Org.). Tópicos em Nanociência e Nanotecnologia. 1 ed. Porto Alegre: Editora da UFRGS, 2010, v. 2 , no prelo. / Ver detalhes

• Radtke, C; Krug, C; Soares, GV; Baumvol, IJR; Lopes, JMJ; Durgun-Ozben, E; Nichau, A; Schubert, J; Mantl, S. 2010. Physicochemical and Electrical Properties of LaLuO3/Ge(100) Structures Submitted to Postdeposition Annealings. Electrochemical and Solid State Letters 13 (5): G37-(2010). / Ver detalhes

• C. Radtke (NAMITEC), C. Krug (UFRGS), G.V. Soares (UFRGS), I.J.R. Baumvol (UFRGS, UCS), J.M.J. Lopes, S. Mantl, "Physicochemical and electrical properties of LaLuO3/Ge(100) structures submitted to postdeposition annealings", Electrochemical and Solid State Letters, 13, G37-G39 (2010). / Ver detalhes

• 2009

• Weber, T. ; Basso, R. L. O. ; SOARES, G. V. ; BAUMVOL, I. J. R. ; VASCONCELLOS, M. A. Z. ; KRUG, C. . Hysteresis effect and film characterization in DC reactive sputtering of titania and alumina. In: 11th International Conference on Advanced Materials, 2009, Rio de Janeiro. / Ver detalhes

• Weber, T. ; Basso, R. L. O. ; SOARES, G. V. ; BAUMVOL, I. J. R. ; VASCONCELLOS, M. A. Z. ; KRUG, C. . Deposition and characterization of DC reactive magnetron sputtered titania and alumina coatings. In: 10th International Workshop on Plasma-Based Ion Implantation and Deposition, 2009, São José dos Campos. 10th International Workshop on Plasma-Based Ion Implantation and Deposition, 2009. / Ver detalhes

• T. Weber, R. L. O. Basso, G. V. Soares, I. J. R. Baumvol, M. A. Z. Vasconcellos, C. Krug. Deposition and characterization of dc reactive magnetron sputtered titania and alumina coatings. 10th International Workshop Plasma-Based Ion Implantation & Deposition. / Ver detalhes

• S. A. Correa, G. G. Marmitt, N. M. Bom, A. T. da Rosa, F. C. Stedile, C. Radtke,
  G. V. Soares, I. J. R. Baumvol, C. Krug, and A. L. Gobbi, Appl. Phys. Enhancement in interface robustness regarding thermal oxidation in nanostructured Al[sub 2]O[sub 3] deposited on 4H-SiC Lett. 95, 051916 (2009), DOI:10.1063/1.3195702. http://dx.doi.org/10.1063/1.3195702. / Ver detalhes

• T. Weber, R. L. O. Basso, G. V. Soares, I. J. R. Baumvol, M. A. Z. Vasconcellos and C. Krug. Hysteresis effect and film characterization in DC reactive sputteringof titania and alumina. 11th International Conference on Advanced Materials.

  Abstract:

  In preparation to the fabrication of TiO2/Al2O3 nanolaminates, titania and alumina thin films were deposited on Si single crystals using DC reactive sputtering. Optimal reactive gas flow was determined from a hysteresis loop obtained with simultaneous operation of Ti and Al targets. Film stoichiometry, deposition rate, phase composition and nanohardness were determined. Results indicate that thermal treatment might be necessary to achieve ultrahardness in nanolaminates fabricated under the conditions studied. / Ver detalhes

• Corrêa, S. A. ; Marmitt, G. G. ; Bom, N. M. ; da Rosa, A. T. ; STEDILE, F. C. ; RADTKE, C.; SOARES, G. V. ; BAUMVOL, I. J. R. ; KRUG, C. ; Gobbi, A. L. . Enhancement in interface robustness regarding thermal oxidation in nanostructured Al2O3 deposited on 4H-SiC. Applied Physics Letters, v. 95, p. 051916, 2009. DOI 10.1063/1.3195702 / Ver detalhes