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Tag "UFRGS"

• 2010

• ZELAYA, E., Schryvers, D., Tolley, A., Fichtner, P. F. P. Cavity nucleation and growth in Cu:Zn:Al irradiated with Cu+ ions at different temperatures. Intermetallics v.18, p. 493 (2010). / Ver detalhes

• Fernandes, V, Schio, P, de Oliveira, A J A, Ortiz, W A, Fichtner, P, AMARAL, L, Graff, I L, Varalda, J, Mattoso, N, Schreiner, W H, Mosca, D H Ferromagnetism induced by oxygen and cerium vacancies above the percolation limit in CeO. Journal of Physics: Condensed Matter. , v.22, p.216004 (2010). / Ver detalhes

• Cornejo, D.R., Peixoto, T.R.F., REBOH, S., Fichtner, P. F. P., de Franco, V.C., Villas-Boas, V., Missell, F.P. First-order-reversal-curve analysis of Pr:Fe:B-based nanocomposites. Journal of Magnetism and Magnetic Materials, v.322, p.827 (2010). / Ver detalhes

• REBOH, S., Barbot, J. F., Beaufort, M. F., Fichtner, P. F. P. H-induced subcritical crack propagation and interaction phenomena in (001) Si using He-cracks templates. Applied Physics Letters. , v.96, p.031907 (2010). / Ver detalhes

• REBOH, S., Schaurich, F., Declemy, A., Barbot, J. F., Beaufort, M. F., Cherkashin, N., Fichtner, P. F. P. On the microstructure of Si coimplanted with H+ and He+ ions at moderate energies. Journal of Applied Physics. , v.108, p.023502 (2010). / Ver detalhes

• Software. PowerMEIS - análise de NPs via espalhamento de íons. O manual pode ser encontrado em:

  https://docs.google.com/fileview?id=0Bw24Rtu3Nv_VZmJmNzdkNzEtNGI2Ni00OWM2LWFlNDMtYjRkNWU1NTUzNmUz&hl=pt_BR / Ver detalhes

• Vasconcellos, MAZ, Lima, S.C. Hinrichs, R. Hardness evaluation, stoichiometru and grain size of titanium nitride films obtained with plasma nitriding on TiAlV samples. First TMS-ABM International Materials Congress. Rio de Janeiro 2010. / Ver detalhes

• Patente depositada com a BRASKEM

  Pub. No.:    WO/2010/001298    International Application No.:    PCT/IB2009/052681

  Publication Date: 07.01.2010 International Filing Date: 22.06.2009

  Chapter 2 Demand Filed: 28.04.2010

  IPC: G01N 31/22 (2006.01), G01N 33/52 (2006.01)

  Applicants: Braskem S.A. [BR/BR]; 1561, Eteno st. Complexo Químico de Camaçari Camaçari (BR) (All Except US).

  Universidade Federal do Rio Grande do Sul [BR/BR]; 110, Paulo Gama Ave. Farroupilha Porto Alegre (BR) (All Except US).

  ACEVEDO, Edwin, Moncada [CO/BR]; (BR) (US Only).

  PIRES, Gilvan, Pozebon [BR/BR]; (BR) (US Only).

  DOS SANTOS, João, Henrique, Zimnoch [BR/BR]; (BR) (US Only). / Ver detalhes

• 2009

• LUCE., F. P., Fichtner, P. F. P., SCHELP, L. F., ZAWISLAK, F. C. Abnormal Grain Growth behavior in nanostructurated Al thin films on SiO2/Si substrates. Materials Research Society Symposia Proceedings. , v.1150, p.133 (2009). / Ver detalhes

• A O dos Santos, R Lang, A S de Menezes, E A Meneses, L Amaral,S Reboh and L P
  Cardoso, Synchrotron x-ray multiple diffraction in the study of Fe+ ion implantation in Si(0 0 1), J. Phys. D: Appl. Phys. 42 (2009) 195401 / Ver detalhes