- 2011
E. F. Motta, G. A. Viana, D. S. Silva, A. D. S. Côrtes, D. Wisnivesky, F. L. Freire Jr. and F.C. Marques. Tetrahedral amorphous carbon deposited by filtered cathodic vacuum arc bombarded by argon, ICMCTF 2011 - 38th International Conference on Metallurgical Coatings & Thin Films, May 2-6, 2011 , San Diego, CA, USA. / Ver detalhes
R. G. F. Gonçalves, R. G. Lacerda, A.S. Ferlauto, L.O. Ladeira, K. Krambrock, M. V. B. Pinheiro, A. S. Leal, G. A. Viana and F. C. Marques. New material for low-dose Brachtherapy seeds: Xe-doped amorphous carbon films with post-growth neutron activated 125I, Applied Radiation and Isotopes, 69(1) 118-121(2011). / Ver detalhes
D. S. da Silva, A. D. S. Côrtes, M. H. Oliveira Jr., E. F. Motta, G. A. Viana, P. R. Mei and F. C. Marques. Application of amorphous carbon based materials as antireflective coatings on crystalline silicon solar cells, J. Appl. Physics, 110, 043510 (2011). / Ver detalhes
E. F. Motta, G. A. Viana, D. S. Silva, A. D. S. Côrtes, D. Wisnivesky, F. L. Freire Jr. and F.C. Marques. Tetrahedral amorphous carbon deposited by filtered cathodic vacuum arc bombarded by argon, ICMCTF 2011 - 38th International Conference on Metallurgical Coatings & Thin Films, May 2-6, 2011 , San Diego, CA, USA. / Ver detalhes
- 2010
M. H. Oliveira, Jr., G. A. Viana, M. M. de Lima, Jr., A. Cros, A. Cantarero, and F. C. Marques. Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition, J. Appl. Phys. 108, 123525 (2010). / Ver detalhes
- 2009
G. A. Viana and F. C. Marques. Amorphous Carbon Deposited By Sputtering And Plasma Enhanced Chemical Vapor Deposition Without Vacuum Pumping During Deposition, International Conference on Metallurgical Coating and Thin Films, San Diego, April 27, 2009. / Ver detalhes
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